DOD · OSD Pre-Release STTR · Phase I
OSW27TZ02-NV001

Wafer-scale low-loss hyperbolic optical material

Parent BAA: DoW STTR 2027 BAA · Release 2
Opens
Dec 2, 2026
Closes
Jan 6, 2027
Deadline
—
Component
OSD

Technical Point of Contact

Jeffery Allen; Monica Allen

During pre-release, until the topic opens on Dec 2, 2026, you may contact the topic author directly with technical questions. After that, questions go through the Topic Q&A on DSIP.

Projected CMMC Level Requirement

Level 1

Technology Areas

  • Electronics
  • Sensors

Modernization Priorities

  • Advanced Materials
  • Microelectronics
  • Quantum Sciences

Keywords

  • Hyperbolic materials
  • Subdiffractional optics
  • Integrated photonics
  • Nanolithography
  • Metrology
  • Quantum emitters
  • Wafer scale.

Objective Summary

The overall goal of the R&D effort is to develop wafer-scale, fabrication-ready thin films of a low-loss naturally hyperbolic optical material that operates across the visible to telecommunication wavelength range. Films should be of high optical and crystalline quality, with controlled thickness and orientation, on substrates at least one inch in cross-sectional diameter.

The full objective, description, Phase I, II and III requirements and evaluation criteria are in the official topic on DSIP.

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Topic details summarized from the official DoW SBIR/STTR solicitation. The full solicitation text, phase descriptions, evaluation criteria and submission requirements are published by the Department of War at dodsbirsttr.mil. Defense Grant Writers does not host or reproduce solicitation content.